The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2016
Filed:
Nov. 21, 2011
Applicants:
Fangyuan Tian, Newark, DE (US);
Douglass F. Taber, Philadelphia, PA (US);
Andrew V. Teplyakov, Newark, DE (US);
Inventors:
Fangyuan Tian, Newark, DE (US);
Douglass F. Taber, Philadelphia, PA (US);
Andrew V. Teplyakov, Newark, DE (US);
Assignee:
UNIVERSITY OF DELAWARE, Newark, DE (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B 33/00 (2006.01); H01L 21/306 (2006.01); B05D 3/10 (2006.01); B05D 1/36 (2006.01);
U.S. Cl.
CPC ...
C01B 33/00 (2013.01); B05D 1/36 (2013.01); B05D 3/10 (2013.01); H01L 21/306 (2013.01);
Abstract
A uniform Si—NH—Si terminated Si(111) surface is formed by contacting a chlorine-terminated silicon surface with ammonia and a solvent such as an ether.