The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2016
Filed:
Sep. 04, 2012
Applicants:
Kian Ping Loh, Singapore, SG;
Yu Wang, Singapore, SG;
Inventors:
Kian Ping Loh, Singapore, SG;
Yu Wang, Singapore, SG;
Assignee:
National University of Singapore, Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25F 5/00 (2006.01); C01B 31/04 (2006.01); B82Y 30/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
C01B 31/0453 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); C01B 31/0469 (2013.01); C01B 31/0484 (2013.01); C25F 5/00 (2013.01); Y02E 60/366 (2013.01);
Abstract
Methods of delaminating a graphene film () from a metal substrate () are disclosed that substantially preserve the metal substrate. The methods include forming a support layer () on the graphene film and then performing an electrochemical process in an electrochemical apparatus (). The electrochemical process creates gas bubbles () at the metal-film interface (), thereby causing the delamination. The graphene film and support layer form a structure () that is collected by a take-up roller (). The support layer and graphene structure are then separated to obtain the graphene film.