The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2016

Filed:

Nov. 01, 2013
Applicants:

Naresh J. Suchak, Glen Rock, NJ (US);

Steven Finley, Wayne, NJ (US);

Inventors:

Naresh J. Suchak, Glen Rock, NJ (US);

Steven Finley, Wayne, NJ (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 53/78 (2006.01); C01B 13/16 (2006.01); C01B 31/20 (2006.01); B01D 53/56 (2006.01); B01D 53/79 (2006.01);
U.S. Cl.
CPC ...
C01B 13/16 (2013.01); B01D 53/56 (2013.01); B01D 53/79 (2013.01); C01B 31/20 (2013.01); B01D 2251/104 (2013.01); B01D 2251/30 (2013.01); B01D 2251/304 (2013.01); B01D 2251/40 (2013.01); B01D 2256/22 (2013.01); B01D 2257/304 (2013.01); B01D 2257/306 (2013.01); B01D 2257/308 (2013.01); B01D 2257/90 (2013.01); B01D 2259/818 (2013.01);
Abstract

An apparatus for removing contaminants from a gas stream includes a reaction chamber for receiving the gas stream; a gas-liquid contact assembly disposed in the reaction chamber; a sump disposed in the reaction chamber beneath the gas-liquid contact assembly, the sump containing a liquid scrubbing agent; a first inlet in communication with the sump for providing a reactive species to the liquid scrubbing agent in the sump for producing an oxidizing solution; a second inlet in communication with the reaction chamber for providing the gas stream to the reaction chamber; and a feed line having a first end in communication with the sump and a second end in communication with the reaction chamber above the gas-liquid contact assembly for dispensing the oxidizing solution to contact the gas-liquid contact assembly.


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