The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2016
Filed:
Jan. 27, 2015
Applicant:
Seiko Epson Corporation, Tokyo, JP;
Inventor:
Takuma Hayashi, Nagano, JP;
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/205 (2006.01); B41J 29/393 (2006.01); B41J 2/21 (2006.01); G06K 15/10 (2006.01);
U.S. Cl.
CPC ...
B41J 29/393 (2013.01); B41J 2/2139 (2013.01); B41J 2/2146 (2013.01); G06K 15/102 (2013.01);
Abstract
An image processing device includes a storing section configured to store a predetermined dither mask, a defective nozzle detecting section configured to detect a defective nozzle, and an interpolation processing section configured to specify a mask position corresponding to a position of the detected defective nozzle among mask positions included in the dither mask, and alter a threshold of a predetermined mask position so that a dot of the predetermined mask position included in the dither mask becomes ON when a dot of the specified mask position is ON.