The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2016
Filed:
Sep. 03, 2013
Sumitomo Electric Industries, Ltd., Osaka-shi, Osaka, JP;
Masaki Yanagisawa, Yokohama, JP;
SUMITOMO ELECTRIC INDUSTRIES, LTD., Osaka, JP;
Abstract
A method fix forming a diffraction grating includes the steps of preparing a mold including pattern portions each having a pattern corresponding to a pattern for the diffraction grating; forming a first semiconductor layer on a substrate; forming a resin layer on the first semiconductor layer; pressing the pattern portions of the mold against the resin layer; forming the pattern for the diffraction grating in the resin layer by curing the resin layer; and forming the diffraction grating in the first semiconductor layer by etching the first semiconductor layer using the patterned resin layer. The mold includes a first base and a plurality of second bases disposed on the first base. The first base is made of a flexible material. Each second base is made of a rigid material. The second bases each include one pattern portion and are spaced apart from each other with a predetermined distance.