The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9272273 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 01, 2016

Filed:

Jan. 30, 2014
Applicant:

Postech Academy-industry Foundation, Pohang-si, KR;

Inventors:

Dong-Pyo Kim, Pohang-si, KR;

Kottagalu Chikkalingaiah Basavaraju, Pohang-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 21/00 (2006.01); B01J 25/00 (2006.01); B01J 29/00 (2006.01); B01J 31/00 (2006.01); B01J 23/00 (2006.01); B01J 31/06 (2006.01); B01J 23/52 (2006.01); B01J 23/50 (2006.01); B01J 23/44 (2006.01); B01J 37/02 (2006.01);
U.S. Cl.
CPC ...
B01J 31/069 (2013.01); B01J 23/44 (2013.01); B01J 23/50 (2013.01); B01J 23/52 (2013.01); B01J 37/0207 (2013.01); B01J 2231/30 (2013.01); B01J 2231/44 (2013.01); B01J 2231/64 (2013.01); B01J 2231/72 (2013.01); B01J 2231/76 (2013.01);
Abstract

This invention relates to a vertically aligned mesoporous silicate film with site-selective metal deposition from a single polymeric precursor and to diverse catalytic applications thereof. There is an innovative approach of a single precursor to manufacture a vertically aligned mesoporous silicate thin film having high thermal and chemical resistance on a large-area silicon wafer (2 cm×3 cm). A precisely designed organic-inorganic block copolymer (BCP) polyethyleneoxide-ss-polyvinylcyclicsilazane (PEO-ss-PVCSZ) with a disulfide bridge that is chemically cleavable is newly synthesized as the single precursor for an oriented silicate nanoporous film, and using such a precursor, solvent annealing, self-assembling, block cleaving treatment, and then hydrolysis conversion of a polymer into a siliceous phase at room temperature are carried out, thus directly forming a mesostructure on the substrate.


Find Patent Forward Citations

Kim, Dong-Pyo. (2016). Vertically aligned mesoporous thin film, method of manufacturing the same, and catalytic application thereof (U.S. Patent No. 9272273). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9272273

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