The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 23, 2016

Filed:

Aug. 28, 2012
Applicants:

Dario Narducci, Milan, IT;

Gianfranco Cerofolini, Milan, IT;

Elena Lonati, Milan, IT;

Inventors:

Dario Narducci, Milan, IT;

Gianfranco Cerofolini, Milan, IT;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 35/28 (2006.01); H01L 21/00 (2006.01); H01L 35/30 (2006.01); H01L 35/22 (2006.01); H01L 35/34 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 35/30 (2013.01); H01L 35/22 (2013.01); H01L 35/34 (2013.01); H01L 21/0262 (2013.01); H01L 21/02532 (2013.01); H01L 21/02573 (2013.01);
Abstract

Significant phonon migration restraint is achieved within a relatively homogeneous polycrystalline doped semiconductor bulk by purposely creating in the crystal lattice of the semiconductor hydrocarbon bonds with the semiconductor, typically Si or Ge, constituting effective organic group substituents of semiconductor atoms in the crystalline domains. An important enhancement of the factor of merit Z of such a modified electrically conductive doped semiconductor is obtained without resorting to nanometric cross sectional dimensions in order to rely on surface scattering eventually enhanced by making the surface highly irregular and/or creating nanocavities within the bulk of the conductive material. A determinant scattering of phonons migrating under the influence and in the direction of a temperature gradient in the homogeneous semiconductor takes place at the organic groups substituents in the crystalline doped semiconductor bulk. Fabrication processes and Seebeck-Peltier energy conversion devices are exemplarily described.


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