The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2016
Filed:
Sep. 24, 2014
Applicant:
SK Hynix Inc., Gyeonggi-do, KR;
Inventor:
Kyoung Chul Jang, Gyeonggi-do, KR;
Assignee:
SK Hynix Inc., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/76 (2006.01); H01L 29/423 (2006.01); H01L 29/78 (2006.01); H01L 29/10 (2006.01); H01L 29/51 (2006.01); H01L 21/306 (2006.01); H01L 21/02 (2006.01); H01L 27/108 (2006.01);
U.S. Cl.
CPC ...
H01L 29/4236 (2013.01); H01L 21/0228 (2013.01); H01L 21/02247 (2013.01); H01L 21/02252 (2013.01); H01L 21/30604 (2013.01); H01L 27/10891 (2013.01); H01L 29/1083 (2013.01); H01L 29/511 (2013.01); H01L 29/518 (2013.01); H01L 29/66484 (2013.01); H01L 29/7831 (2013.01);
Abstract
A semiconductor device includes a semiconductor substrate including a trench, a gate insulation film located over a bottom and sidewall of the trench, a first gate formed over the gate insulation film and in a lower portion of the trench, a second gate formed over the first gate and in an upper portion of the trench, a multi-layered structure provided between the gate insulation film and the second gate.
Jang, Kyoung. (2016). Semiconductor device and method for forming the same (U.S. Patent No. 9269780). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9269780
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile