The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2016
Filed:
Feb. 07, 2014
Kabushiki Kaisha Toshiba, Minato-ku, JP;
Hiroaki Ashidate, Oita, JP;
Kabushiki Kaisha Toshiba, Minato-ku, JP;
Abstract
According to one embodiment, the method of manufacturing a solid-state imaging device includes: forming a plurality of photoelectric conversion elements by two-dimensionally arranging semiconductor areas of a second conductivity type at a semiconductor layer of a first conductivity type in a matrix pattern; forming the photoelectric conversion elements in a rectangular shape in plan view, the photoelectric conversion elements being formed by forming a grid-like trench in plan view so as to partition the semiconductor layer; forming the photoelectric conversion element formed into the rectangular shape in plan view into a convex polygonal shape in plan view whose number of corners is larger than the number of corners of a rectangular; and forming an element isolation area including a light shielding member at a trench coated with an insulating film after coating an inner peripheral surface of the trench with the insulating film.