The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 23, 2016

Filed:

Mar. 23, 2015
Applicant:

Hitachi High-tech Science Corporation, Minato-ku, Tokyo, JP;

Inventors:

Tatsuya Asahata, Tokyo, JP;

Hidekazu Suzuki, Tokyo, JP;

Makoto Sato, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/00 (2006.01); H01J 37/317 (2006.01); H01J 37/244 (2006.01); H01J 37/22 (2006.01);
U.S. Cl.
CPC ...
H01J 37/317 (2013.01); H01J 37/222 (2013.01); H01J 37/244 (2013.01); H01J 2237/2448 (2013.01); H01J 2237/31749 (2013.01);
Abstract

A focused ion beam apparatus includes: a focused ion beam tube configured to irradiate a focused ion beam onto a sample; a detector configured to detect secondary particles generated from the sample due to the irradiation and to output detection information regarding detected secondary particles; an image forming unit configured to form an observation image of the sample based on the detection information; a storage unit configured to store positional relation between a first processing area set on an observation image of a first sample and a cross-section surface of the first sample; and a processing area setting unit configured to automatically set a second processing area on an observation image of a second sample based on the positional relation stored in the storage unit and a position of a cross-section surface of the second sample on the observation image of the second sample.


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