The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2016
Filed:
Sep. 20, 2010
Kallol Bera, San Jose, CA (US);
Xiaoping Zhou, San Jose, CA (US);
Douglas A. Buchberger, Jr., Livermore, CA (US);
Andrew Nguyen, San Jose, CA (US);
Hamid Tavassoli, Cupertino, CA (US);
Surajit Kumar, Sunnyvale, CA (US);
Shahid Rauf, Pleasanton, CA (US);
Kallol Bera, San Jose, CA (US);
Xiaoping Zhou, San Jose, CA (US);
Douglas A. Buchberger, Jr., Livermore, CA (US);
Andrew Nguyen, San Jose, CA (US);
Hamid Tavassoli, Cupertino, CA (US);
Surajit Kumar, Sunnyvale, CA (US);
Shahid Rauf, Pleasanton, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Apparatus for controlling the thermal uniformity of a substrate. In some embodiments, the thermal uniformity of the substrate is controlled to be more uniform. In some embodiments, the thermal uniformity of the substrate is controlled to be non-uniform in a desired pattern. In some embodiments, an apparatus for controlling thermal uniformity of a substrate includes a substrate support having a support surface to support a substrate thereon. A plurality of flow paths having a substantially equivalent fluid conductance are disposed within the substrate support to flow a heat transfer fluid beneath the support surface.