The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2016
Filed:
Feb. 25, 2014
Applicant:
National Chung-hsing University, Taichung, TW;
Inventors:
Chen-Ju Liang, Taichung, TW;
Ya-Ting Lin, Taichung, TW;
Assignee:
NATIONAL CHUNG-HSING UNIVERSITY, Taichung, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C02F 1/66 (2006.01); C02F 1/70 (2006.01); C02F 103/06 (2006.01); C02F 101/16 (2006.01); C02F 101/36 (2006.01);
U.S. Cl.
CPC ...
C02F 1/705 (2013.01); C02F 1/66 (2013.01); B01D 2251/108 (2013.01); C02F 2101/16 (2013.01); C02F 2101/36 (2013.01); C02F 2103/06 (2013.01);
Abstract
A process for treating halide contaminated waste includes bringing the contaminated waste into contact with a reductone in an aqueous solution to obtain a mixture having a pH value, and adjusting the pH value to permit dissociation of two hydrogen ions from an enediol group of the reductone and to permit subsequent reaction of the reductone with an electrophilic site of halide contained in the contaminated waste. Halide can thus be removed.