The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2016
Filed:
Dec. 10, 2012
Massachusetts Institute of Technology, Cambridge, MA (US);
Joseph Edward Petrzelka, Cambridge, MA (US);
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
Method for casting a continuous cylindrical polymer stamp. The method includes depositing a first layer of a fluid polymer on the inside of a rotatable drum and rotating the drum for a selected time and at a selected angular velocity. The polymer is cured to produce a uniform datum surface. A second layer of polymer is deposited on the first layer in the drum and the drum is rotated until solvent in the polymer has evaporated thereby forming a stable layer. The polymer is selectively exposed and developed to create a desired pattern. Thereafter, a polymer precursor is deposited on the patterned second layer and the polymer precursor is allowed to cure while the drum is rotating to produce a cured stamp. The cured stamp is removed from the drum.