The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2016
Filed:
Jun. 15, 2011
Shinichi Tanifuji, Kobe, JP;
Kenji Yamamoto, Kobe, JP;
Homare Nomura, Takasago, JP;
Yoshinori Kurokawa, Takasago, JP;
Naoyuki Goto, Takasago, JP;
Shinichi Tanifuji, Kobe, JP;
Kenji Yamamoto, Kobe, JP;
Homare Nomura, Takasago, JP;
Yoshinori Kurokawa, Takasago, JP;
Naoyuki Goto, Takasago, JP;
Kobe Steel, Ltd., Hyogo, JP;
Abstract
An arc evaporation source having fast film-forming speed includes: at least one circumference magnet surrounding the circumference of a target, wherein the magnetization direction of the magnet runs orthogonal to the target surface; a non-ring shaped first permanent magnet on the target's rear surface side has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the target's surface; a non-ring shaped second permanent magnet arranged either on the rear surface side of the first permanent magnet or between the first permanent magnet and the target, so as to leave a gap from the first permanent magnet, has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the surface of the target; and a magnetic body between the first permanent magnet and the second permanent magnet.