The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2016
Filed:
Mar. 13, 2012
Satoshi Seo, Kanagawa, JP;
Hisao Ikeda, Kanagawa, JP;
Manabu Niboshi, Osaka, JP;
Katsunori Mitsuhashi, Osaka, JP;
Seiichi Mitsui, Osaka, JP;
Yoshitaka Yamamoto, Osaka, JP;
Satoshi Seo, Kanagawa, JP;
Hisao Ikeda, Kanagawa, JP;
Manabu Niboshi, Osaka, JP;
Katsunori Mitsuhashi, Osaka, JP;
Seiichi Mitsui, Osaka, JP;
Yoshitaka Yamamoto, Osaka, JP;
Abstract
A successive deposition apparatus by which a reduction in the luminous efficiency of a light-emitting element can be suppressed even in high-speed deposition of a light-emitting layer thereof is provided. The apparatus includes: a second deposition chamber; a third deposition chamber coupled to the second deposition chamber; a transfer unit for transferring a substrate from second deposition chamber to third deposition chamber; plural third deposition sources arranged in the substrate transfer direction in the second deposition chamber; and a fourth and fifth deposition sources alternately arranged in the transfer direction in the third deposition chamber. In the third deposition chamber, the fourth deposition source is placed nearest to the second deposition source. The fourth deposition source contains a host material, and the fifth deposition source contains a dopant material. The HOMO level of a material of the third deposition source is adjusted to that of the host material.