The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2016
Filed:
Mar. 09, 2012
Pingshan LI, Sunnyvale, CA (US);
Kensuke Miyagi, Sunnyvale, CA (US);
Pingshan Li, Sunnyvale, CA (US);
Kensuke Miyagi, Sunnyvale, CA (US);
Sony Corporation, Tokyo, JP;
Abstract
A methodology for performing a depth estimation procedure with defocused images under extreme lighting conditions includes a camera device with a sensor for capturing blur images of a photographic target under extreme lighting conditions. The extreme lighting conditions may include over-exposed conditions and/or under-exposed conditions. The camera device also includes a depth generator that performs the depth estimation procedure by utilizing the captured blur images. The depth estimation procedure includes a clipped-pixel substitution procedure to compensate for the extreme lighting conditions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile