The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9262576 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 16, 2016

Filed:

Apr. 07, 2014
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventor:

Hanno Melzner, Sauerlach, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5081 (2013.01); G06F 17/5068 (2013.01);
Abstract

A method provides a layout defining a structure to be patterned onto a substrate. The structure is registered with a predefined grid of the layout. The method includes locally stretching the grid in a first portion of a layout causing a problematic spot on the substrate.


Find Patent Forward Citations

Melzner, Hanno. (2016). Method and apparatus for providing a layout defining a structure to be patterned onto a substrate (U.S. Patent No. 9262576). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9262576

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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