The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2016
Filed:
Oct. 23, 2013
Shin-etsu Chemical Co., Ltd., Chiyoda-ku, Tokyo, JP;
Takeshi Kinsho, Joetsu, JP;
Yuuki Suka, Joetsu, JP;
Yuji Harada, Joetsu, JP;
Koji Hasegawa, Joetsu, JP;
Takeshi Sasami, Joetsu, JP;
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Abstract
A fluorinated ester monomer is provided having formula (1) wherein Ris H, CHor CF, Rand Rare H or a monovalent hydrocarbon group, or Rand Rforms a hydrocarbon ring, Ris a monovalent hydrocarbon group, and k is 0 or 1. A polymer obtained from the monomer has transparency to radiation with a wavelength of up to 200 nm and appropriate alkaline hydrolysis, is constructed such that any of water repellency, water slip and surface segregation may be adjusted by a choice of its structure, and is useful in forming ArF immersion lithography materials.