The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 16, 2016

Filed:

Dec. 20, 2013
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Beijing Boe Display Technology Co., Ltd., Beijing, CN;

Inventors:

Tonghua Yang, Beijing, CN;

Hongjiang Wu, Beijing, CN;

Changgang Huang, Beijing, CN;

Jianfeng Yuan, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/028 (2006.01); G03F 7/00 (2006.01); G02F 1/1335 (2006.01); G03F 7/027 (2006.01); G02B 1/04 (2006.01); G02B 5/23 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); B01J 13/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/002 (2013.01); G02B 1/04 (2013.01); G02B 5/23 (2013.01); G02F 1/1335 (2013.01); G03F 7/0042 (2013.01); G03F 7/027 (2013.01); G03F 7/038 (2013.01); B01J 13/02 (2013.01);
Abstract

An auto-repairing photoresist composition comprises 1 to 10 wt % of microcapsule having a capsule wall and a capsule core based on the total weight of the photoresist composition, wherein the capsule wall includes an alkali-insoluble resin, and the capsule core includes: 10 to 60 wt % of a photo-curable unsaturated resin oligomer; 10 to 50 wt % of a photo-curable monomers; 10 to 70 wt % of a first black pigment paste; 0.1 to 10 wt % of a first photo-initiator; and 0.1 to 5 wt % of a coupling agent, based on the total weight of the capsule core. The photoresist composition of embodiments of the present invention can be used for preparation of Black Matrix, and has an auto-repairing property to improve substantially the pass yield of product. A method of preparing the photoresist composition, a color filter substrate, and a display apparatus are also disclosed.


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