The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 16, 2016

Filed:

Aug. 27, 2013
Applicant:

Dainippon Screen Mfg. Co., Ltd, Kyoto-shi, Kyoto, JP;

Inventors:

Tetsuya Emoto, Kyoto, JP;

Manabu Okutani, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/12 (2006.01); B05D 1/00 (2006.01); B05C 9/12 (2006.01); B05D 5/08 (2006.01); H01L 21/67 (2006.01); B05D 3/02 (2006.01); B05D 3/04 (2006.01);
U.S. Cl.
CPC ...
B05D 1/005 (2013.01); B05C 9/12 (2013.01); B05D 5/08 (2013.01); H01L 21/6708 (2013.01); H01L 21/67051 (2013.01); H01L 21/67057 (2013.01); H01L 21/67086 (2013.01); B05D 3/02 (2013.01); B05D 3/0254 (2013.01); B05D 3/0493 (2013.01); H01L 21/6715 (2013.01);
Abstract

A substrate treatment method is provided, which includes: a liquid film forming step of forming a liquid film of a treatment liquid on a front surface of a substrate; a hydrophobization liquid supplying step of supplying a hydrophobization liquid to a center portion of the front surface of the substrate for hydrophobizing the front surface of the substrate, while rotating the substrate; an inactivation suppressing step of suppressing inactivation of the supplied hydrophobization liquid on a peripheral edge portion of the front surface of the substrate simultaneously with the hydrophobization liquid supplying step; and a drying step of drying the substrate to which the hydrophobization liquid has been supplied.


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