The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 09, 2016

Filed:

Apr. 21, 2015
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventor:

Go Sakaino, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 5/343 (2006.01); H01S 5/227 (2006.01); H01S 5/34 (2006.01); H01S 5/125 (2006.01); H01S 5/10 (2006.01);
U.S. Cl.
CPC ...
H01S 5/343 (2013.01); H01S 5/10 (2013.01); H01S 5/125 (2013.01); H01S 5/227 (2013.01); H01S 5/3407 (2013.01);
Abstract

An optical semiconductor device includes: a mesa stripe structure including an n-type cladding layer, an active layer, and a p-type cladding layer laid one on another; and a buried layer buried on opposite sides of the mesa stripe structure, wherein the active layer is a multiple quantum well structure having well layers and carbon-doped barrier layers, the buried layer includes a p-type semiconductor layer and an Fe-doped or Ru-doped high-resistance semiconductor layer laid one on another, side surfaces of the n-type cladding layer are covered with the p-type semiconductor layer and are not contiguous with the high-resistance semiconductor layer, and side surfaces of the active layer are not contiguous with the p-type semiconductor layer.


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