The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2016
Filed:
Jul. 17, 2012
Ji-yun Kwon, Uiwang-si, KR;
Jong-hwa Lee, Uiwang-si, KR;
Hyun-yong Cho, Uiwang-si, KR;
Dae-yun Kim, Uiwang-si, KR;
Sang-kyeon Kim, Uiwang-si, KR;
Sang-kyun Kim, Uiwang-si, KR;
Sang-soo Kim, Uiwang-si, KR;
Eun-kyung Yoon, Uiwang-si, KR;
Jun-ho Lee, Uiwang-si, KR;
Jin-young Lee, Uiwang-si, KR;
Hwan-sung Cheon, Uiwang-si, KR;
Chung-beom Hong, Uiwang-si, KR;
Eun-ha Hwang, Uiwang-si, KR;
Ji-Yun Kwon, Uiwang-si, KR;
Jong-Hwa Lee, Uiwang-si, KR;
Hyun-Yong Cho, Uiwang-si, KR;
Dae-Yun Kim, Uiwang-si, KR;
Sang-Kyeon Kim, Uiwang-si, KR;
Sang-Kyun Kim, Uiwang-si, KR;
Sang-Soo Kim, Uiwang-si, KR;
Eun-Kyung Yoon, Uiwang-si, KR;
Jun-Ho Lee, Uiwang-si, KR;
Jin-Young Lee, Uiwang-si, KR;
Hwan-Sung Cheon, Uiwang-si, KR;
Chung-Beom Hong, Uiwang-si, KR;
Eun-Ha Hwang, Uiwang-si, KR;
Cheil Industries Inc., Gumi-si, KR;
Abstract
Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin selected from a polybenzoxazole precursor, a polyimide precursor, and a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) an organic dye and (E) a solvent, wherein the organic dye (D) includes at least one red dye having an absorption wavelength of 590 to 700 nm, at least one yellow dye having an absorption wavelength of 550 to 590 nm, and at least one blue dye having an absorption wavelength of 450 to 500 nm.