The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2016
Filed:
Oct. 03, 2013
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Inventors:
In-Kwon Kim, Hwaseong-si, KR;
Kyung-Hyun Kim, Seoul, KR;
Ki-Jong Park, Yongin-si, KR;
Ki-Ho Bae, Seoul, KR;
Jong-Heun Lim, Hwaseong-si, KR;
Assignee:
SAMSUNG ELECTRONICS CO., LTD., Suwon-Si, Gyeonggi-Do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 37/30 (2012.01); B24B 37/32 (2012.01); B24B 37/10 (2012.01); B24B 37/04 (2012.01);
U.S. Cl.
CPC ...
B24B 37/30 (2013.01); B24B 37/042 (2013.01); B24B 37/10 (2013.01); B24B 37/32 (2013.01);
Abstract
A chemical mechanical polishing machine includes a polishing head assembly including a polishing head body and a membrane disposed at a bottom of the polishing head body. The bottom surface of the membrane includes a hydrophobic area and a hydrophilic area.
Kim, In-Kwon. (2016). Chemical mechanical polishing machine and polishing head assembly (U.S. Patent No. 9254546). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9254546
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile