The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 09, 2016

Filed:

Aug. 28, 2008
Applicants:

Jiangwei Feng, Painted Post, NY (US);

Mai Phung, Rochester, NY (US);

Robert Sabia, Corning, NY (US);

Inventors:

Jiangwei Feng, Painted Post, NY (US);

Mai Phung, Rochester, NY (US);

Robert Sabia, Corning, NY (US);

Assignee:

Corning Incorporated, Corning, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01); B24B 7/30 (2006.01); G11B 9/00 (2006.01); B24B 13/00 (2006.01); G02B 1/02 (2006.01); G02B 27/00 (2006.01);
U.S. Cl.
CPC ...
B24B 13/00 (2013.01); G02B 1/02 (2013.01); G02B 27/0006 (2013.01); Y10T 428/268 (2015.01);
Abstract

The invention is directed to a method for finishing alkaline earth metal fluoride optical components and to the alkaline earth optical elements produced using the method. In particular, in the last polishing step, the method of the invention uses a colloidal silica polishing slurry having containing silica particles having a particle size of <500 nm. Additionally, after colloidal silica polishing, the method using a megasonic cleaning step with a high pH detergent cleaning solution to remove any silica residue on the polished optical component. The optic resulting from use of the method has a polished and unetched surface roughness of less than 0.5 nm; a surface roughness of less then 0.6 nm after polishing and etching; and a step height of less than 6 nm.


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