The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2016
Filed:
Dec. 17, 2013
Ushio Denki Kabushiki Kaisha, Tokyo-to, JP;
Sven Walter Probst, Aachen, DE;
Mohamad Hussein El-Husseini, Milmort, BE;
Takahiro Hiraoka, Himeji, JP;
USHIO Denki Kabushiki Kaisha, Tokyo-to, JP;
Abstract
A method for controlling a discharge plasma-based radiation source for stabilizing a radiation dose emitted in a pulsed manner is disclosed. A calibration function is determined from a relationship between values of an input quantity and values of an operating parameter of the source by applying different values of the input quantity to the source. Reference value selected from the values of the operating parameter is brought about during a pulse of the source. The value of a test quantity is acquired at each pulse. Any quantity influencing the emitted radiation dose can be selected as test quantity. A statistical value is formed from a defined quantity of values of the test quantity. A deviation between the statistical value and the reference value is determined. A result of a comparison of the deviation with a predefined tolerance range determines whether the method is repeated.