The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9252245 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 02, 2016

Filed:

Sep. 05, 2014
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Murat Akarvardar, Saratoga Springs, NY (US);

Rama Kambhampati, Guilderland, NY (US);

Assignee:

GLOBALFOUNDRIES INC., Grand Cayman, KY;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 27/088 (2006.01); H01L 21/3065 (2006.01); H01L 21/306 (2006.01); H01L 29/45 (2006.01); H01L 21/3105 (2006.01); H01L 21/283 (2006.01);
U.S. Cl.
CPC ...
H01L 29/6681 (2013.01); H01L 21/283 (2013.01); H01L 21/3065 (2013.01); H01L 21/30604 (2013.01); H01L 21/31053 (2013.01); H01L 29/45 (2013.01);
Abstract

A methodology for spacer-last replacement metal gate (RMG) flow that exhibits reduced variability, and the resulting device are disclosed. Embodiments may include forming a dummy gate stack comprising a dummy nitride portion on a dummy oxide portion on a substrate, forming source/drain regions in the substrate at opposite sides of the dummy gate stack, depositing an insulating material over the source/drain regions, coplanar with the dummy gate stack, and replacing the dummy gate stack with a metal gate stack and spacers.


Find Patent Forward Citations

Akarvardar, Murat. (2016). Spacer-last replacement metal gate flow and device (U.S. Patent No. 9252245). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9252245

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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