The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2016

Filed:

Jan. 11, 2013
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Marko Lemke, Dresden, DE;

Stefan Tegen, Dresden, DE;

Uwe Rudolph, Dresden, DE;

Assignee:

INFINEON TECHNOLOGIES AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01); B82Y 40/00 (2011.01); H01B 13/00 (2006.01); C01B 31/02 (2006.01);
U.S. Cl.
CPC ...
H01B 13/00 (2013.01); C01B 31/02 (2013.01); H01L 21/3065 (2013.01); B82Y 40/00 (2013.01);
Abstract

A method for manufacturing a plurality of nanowires, the method including: providing a carrier comprising an exposed surface of a material to be processed and applying a plasma treatment on the exposed surface of the material to be processed to thereby form a plurality of nanowires from the material to be processed during the plasma treatment.


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