The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2016
Filed:
Mar. 19, 2014
National Chiao Tung University, Hsinchu, TW;
Jiun-In Guo, Hsinchu, TW;
Hsiu-Cheng Chang, Tainan, TW;
Cheng-An Chien, Taipei, TW;
Kai-Chen Huang, New Taipei, TW;
NATIONAL CHIAO TUNG UNIVERSITY, Hsinchu, TW;
Abstract
An optimal dynamic seam adjustment system for image stitching includes an image obtaining module, a feature difference calculation module and a dynamic seam module. The image obtaining module obtains at least two images to be stitched, which have at least one overlapping area divided into a plurality of pixels arranged in a plurality of pixel columns and a plurality of pixel rows. The feature difference calculation module calculates a feature difference value for each pixel within the overlapping area. The dynamic seam module establishes a plurality of dynamic seam routes started from a top end of the overlapping area, so as to find an optimal dynamic seam route based on the feature difference value, wherein each dynamic seam route is composed of a plurality of pixels.