The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2016
Filed:
Apr. 13, 2011
Applicant:
Serdar Manakli, Meyrie, FR;
Inventor:
Serdar Manakli, Meyrie, FR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61N 5/00 (2006.01); G03B 27/32 (2006.01); G03B 27/54 (2006.01); G03F 7/20 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70558 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); H01J 37/3174 (2013.01);
Abstract
A lithography method for a pattern to be etched on a support, notably to a method using electron radiation with direct writing on the support. Hitherto, the methods for correcting the proximity effects for dense network geometries (line spacings of 10 to 30 nm) have been reflected in a significant increase in the radiated doses and therefore in the exposure time. According to the invention, the patterns to be etched are modified as a function of the energy latitude of the process, which allows a reduction of the radiated doses.