The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2016
Filed:
Apr. 03, 2012
Chang-hoon Kim, Asan-si, KR;
Kab-jong Seo, Seoul, KR;
Samsung Display Co., Ltd., Yongin-si, KR;
Abstract
An exposure apparatus includes a light source, a mask and a blind. The light source is disposed over a substrate. The light source cyclically radiates light. The mask is disposed between the light source and the substrate. The mask includes an exposure region and a peripheral region. The peripheral region surrounds the exposure region. A pattern is formed in the exposure region. A plurality of first alignment marks is disposed in the peripheral region. The blind is disposed between the light source and the mask. The blind includes a blocking plate and an adjusting part. The blocking part may move across the substrate. The blocking plate includes second alignment marks disposed at end portions of the blocking plate, opposite to each other. The adjusting part adjusts a position of the blocking plate.