The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2016
Filed:
Dec. 16, 2014
Aerodyne Research, Inc., Billerica, MA (US);
J. Barry McManus, Arlington, MA (US);
AERODYNE RESEARCH, INC., Billerica, MA (US);
Abstract
In one embodiment, an improved multi-pass cell for a long path-length spectrometer is designed to include a perturbing mirror that causes a base pattern of reflections to be repeated multiple times, where each subsequent base pattern of reflections is rotated about the axis at an angle from a prior base pattern, to circulate the base patters about the cell. The base pattern may be a Herriott cell pattern. The improved multi-pass cell may be constructed with a concave front mirror centered along an axis of the cell, and a concave back mirror centered along the axis and facing the front mirror. The perturbing mirror may be centered along the axis, facing the front mirror and located at a perturbing mirror spacing in front of the back mirror or behind the back mirror, depending on the implementation.