The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2016
Filed:
Jul. 26, 2012
Tomotake Nashiki, Osaka, JP;
Yoshimasa Sakata, Osaka, JP;
Hideo Sugawara, Osaka, JP;
Kenkichi Yagura, Osaka, JP;
Akira Hamada, Osaka, JP;
Yoshihisa Ito, Osaka, JP;
Kuniaki Ishibashi, Osaka, JP;
Tomotake Nashiki, Osaka, JP;
Yoshimasa Sakata, Osaka, JP;
Hideo Sugawara, Osaka, JP;
Kenkichi Yagura, Osaka, JP;
Akira Hamada, Osaka, JP;
Yoshihisa Ito, Osaka, JP;
Kuniaki Ishibashi, Osaka, JP;
NITTO DENKO CORPORATION, Ibaraki-Shi, Osaka, JP;
Abstract
The film formation method comprises the steps of: unrolling and feeding an elongated substrate wound in a roll form from a first roll chamber in a first direction from the first roll chamber toward a second roll chamber, using a first surface as a surface for film formation; degassing the substrate fed in the first direction; forming a second material film on the first surface of the substrate in a second film formation chamber; taking up the substrate in a roll form in the second roll chamber, the substrate having the second material film formed thereon; unrolling and feeding the substrate from the second roll chamber in a second direction from the second roll chamber toward the first roll chamber; forming a first material film on the second material film in a first film formation chamber; taking up the substrate in a roll form in the first roll chamber.