The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2016
Filed:
Aug. 28, 2014
Momentive Performance Materials Inc., Waterford, NY (US);
Kenrick Martin Lewis, Flushing, NY (US);
Yanjun Zhu, Dobbs Ferry, NY (US);
Abellard T. Mereigh, Mt. Vernon, NY (US);
John Razzano, Waterford, NY (US);
John David Neely, Clifton Park, NY (US);
Momentive Performance Materials Inc., Waterford, NY (US);
Abstract
The present invention is directed to a process for the synthesis of organohalosilane monomers, comprising the steps of (1) forming a slurry of cyclone fines, ultra fines and/or spent contact mass in a thermally stable solvent and reacting the agitated slurry with an organohalide of the formula RX in the presence of an additive for a time and at a temperature sufficient to produce organohalosilane monomers having the formulae RSiHX, RSiHX, RSiX, RSiX, and RSiX; wherein Ris a saturated or unsaturated aromatic group, a saturated or unsaturated aliphatic group, alkaryl group, or cycloaliphatic hydrocarbyl group, and X is a halogen; and (2) recovering said organohalosilane monomers.