The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2016

Filed:

Mar. 27, 2014
Applicant:

Seiko Epson Corporation, Tokyo, JP;

Inventors:

Masatoshi Ono, Suwa, JP;

Christoph Meyerhoff, Krefeld, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23P 21/00 (2006.01); B23Q 7/04 (2006.01); G05B 19/418 (2006.01); B23Q 7/14 (2006.01); B25J 9/04 (2006.01); H05K 13/04 (2006.01);
U.S. Cl.
CPC ...
B23P 21/004 (2013.01); B23P 21/00 (2013.01); B23Q 7/04 (2013.01); B23Q 7/14 (2013.01); B25J 9/042 (2013.01); G05B 19/4182 (2013.01); H05K 13/0452 (2013.01); G05B 2219/31076 (2013.01); Y10T 29/49828 (2015.01); Y10T 29/49829 (2015.01); Y10T 29/49831 (2015.01); Y10T 29/534 (2015.01); Y10T 29/53313 (2015.01); Y10T 29/53365 (2015.01); Y10T 29/53383 (2015.01); Y10T 29/53435 (2015.01); Y10T 29/53539 (2015.01);
Abstract

In a production system general-purpose cell for general-purpose use in processing and transportation of a received workpiece in a production system of processing and delivering the workpiece, the production system general-purpose cell includes a base unit having a planar shape of quadrangle and supporting at least a robot for use in transportation of the workpiece such that the robot is movable on the planar area of quadrangle, a parts supply unit for supplying parts of the workpiece to the robot supported by the base unit, and a processing area extending outside the base unit. The robot supported by the base unit having a motion range set in a range from inside to outside the base unit in a form including at least part of the processing area.


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