The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2016
Filed:
Jan. 18, 2013
Heraeus Noblelight Gmbh, Hanau, DE;
Sven Linow, Darmstadt, DE;
Larisa von Riewel, Mainaschaff, DE;
Heraeus Noblelight GmbH, Hanau, DE;
Abstract
Known apparatuses for irradiating a substrate include a receptacle for the substrate to be irradiated having a circular irradiation surface and a first optical emitter having at least one emitter tube arranged in an illumination plane extending parallel to the irradiation surface. The illumination length of the emitter tube includes a middle section and two end sections, the length of the middle section accounting for at least 50% of the illumination length. The receptacle and the optical emitter are movable relative to each other. An apparatus for thermal treatment of a substrate, enabling ho-mogeneous and/or rotationally symmetrical heating of the substrate and requiring less complexity in its design and control technology, includes a middle section of the emitter tube having a steadily decreasing curvature, provided that the illumination length of the emitter tube extends over an angle of curvature of less than 2π.