The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2016

Filed:

Aug. 02, 2012
Applicants:

Atsushi Murata, Tokyo, JP;

Eiichi Yamada, Tokyo, JP;

Shinji Fukumoto, Tokyo, JP;

Inventors:

Atsushi Murata, Tokyo, JP;

Eiichi Yamada, Tokyo, JP;

Shinji Fukumoto, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 29/66 (2006.01); B01D 35/12 (2006.01); B01D 35/027 (2006.01); C10G 2/00 (2006.01); C10G 31/09 (2006.01);
U.S. Cl.
CPC ...
B01D 29/668 (2013.01); B01D 29/66 (2013.01); C10G 2/00 (2013.01); C10G 31/09 (2013.01); B01D 35/027 (2013.01); B01D 35/12 (2013.01); C10G 2300/1022 (2013.01);
Abstract

A filter cleaning apparatus used in a reaction system including; a reaction tank having a filter, first feed line connected to the filter at one end, a recovery tank connected to the other end of the first feed line, and second feed line connected to the recovery tank at one end, is provided. The filter cleaning apparatus includes; first return line connected the second feed line at one end, first and second reverse cleaning solution tanks connected to the first return line, a first flow rate adjusting valve that can adjust filtered fluid to be supplied to the first reverse cleaning solution tank, a second flow rate adjusting valve that can adjust filtered fluid to be supplied to the second reverse cleaning solution tank, and a switching section that carries either one of the filtered fluids accommodated in these reverse cleaning solution tanks by switching.


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