The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 26, 2016

Filed:

Nov. 19, 2014
Applicant:

Japan Display Inc., Minato-ku, JP;

Inventors:

Yasunori Fukumoto, Minato-ku, JP;

Toshihide Jinnai, Minato-ku, JP;

Koji Sato, Minato-ku, JP;

Assignee:

Japan Display Inc., Minato-ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/77 (2006.01); H01L 27/12 (2006.01); G02F 1/1333 (2006.01); G02F 1/1343 (2006.01); H01L 29/768 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1259 (2013.01); G02F 1/133345 (2013.01); G02F 1/134363 (2013.01); H01L 29/768 (2013.01);
Abstract

According to one embodiment, provided is an array substrate that can effectively prevent an oxide conductive film and a silicon nitride film on the oxide conductive film from peeling without deteriorating reliability. A method for manufacturing the array substrate includes a surface treatment step and a nitride film forming step. In the surface treatment step, by plasma discharge, the oxide conductive film is cleaned without being reduced, and surface layers of the insulating film layer not covered by the oxide conductive film and portions of the insulating film layer in the regions covered by the oxide conductive film are etched to form recesses leading to portions under the oxide conductive film. In the nitride film forming step, successively from the surface treatment step, the silicon nitride film is formed by plasma CVD so as to cover the recesses and the oxide conductive film.


Find Patent Forward Citations

Fukumoto, Yasunori. (2016). Method for manufacturing board device (U.S. Patent No. 9245910). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9245910

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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