The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2016
Filed:
Nov. 23, 2012
Applicants:
Sung-jae Lee, Uiwang-si, KR;
Joon-young Moon, Uiwang-si, KR;
Youn-jin Cho, Uiwang-si, KR;
Young-min Kim, Uiwang-si, KR;
Yong-woon Yoon, Uiwang-si, KR;
Inventors:
Sung-Jae Lee, Uiwang-si, KR;
Joon-Young Moon, Uiwang-si, KR;
Youn-Jin Cho, Uiwang-si, KR;
Young-Min Kim, Uiwang-si, KR;
Yong-Woon Yoon, Uiwang-si, KR;
Assignee:
CHEIL INDUSTRIES, INC., Gumi-si, Gyeongsangbuk-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/40 (2006.01); G03F 7/11 (2006.01); G03F 7/09 (2006.01); H01L 21/027 (2006.01); G03F 7/075 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
G03F 7/094 (2013.01); G03F 7/0752 (2013.01); G03F 7/09 (2013.01); G03F 7/091 (2013.01); G03F 7/40 (2013.01); H01L 21/0276 (2013.01); H01L 21/0332 (2013.01);
Abstract
A composition for a hardmask including copolymer including repeating units represented by Chemical Formulae 1 and 2 and a solvent, a method of forming a pattern using the same, and a semiconductor integrated circuit device including a pattern formed using the method are provided.