The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2016
Filed:
Dec. 10, 2009
Nawale Khalef, Meylan, FR;
Aziz Bakri, Grenoble, FR;
Nawale Khalef, Meylan, FR;
Aziz Bakri, Grenoble, FR;
UNIVERSITE JOSEPH FOURIER, Grenoble, FR;
Abstract
The use of a vapor source () in an isothermal system () to control the crystallization or recrystallization of a sample of solid material () which is initially at least partially amorphous and/or at least partially crystalline and contained within the system (), the vapor source () including at least one solvent for crystallizing the solid material, the vapor diffusion () of which leads to the crystallization or recrystallization of the sample (), the vapor source () being such that the quantities of heat exchanged within the system during the crystallization or recrystallization of the sample () other than the heat of crystallization or recrystallization of the sample are less than approximately 10%, particularly 5%, and advantageously 1% of the heat of crystallization or recrystallization of the sample. The vapor source () is preferably a pure solvent or a solvent mixture in which no solute is dissolved.