The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2016
Filed:
Jul. 26, 2012
Tomotake Nashiki, Osaka, JP;
Yoshimasa Sakata, Osaka, JP;
Hideo Sugawara, Osaka, JP;
Kenkichi Yagura, Osaka, JP;
Akira Hamada, Osaka, JP;
Yoshihisa Ito, Osaka, JP;
Kuniaki Ishibashi, Osaka, JP;
Tomotake Nashiki, Osaka, JP;
Yoshimasa Sakata, Osaka, JP;
Hideo Sugawara, Osaka, JP;
Kenkichi Yagura, Osaka, JP;
Akira Hamada, Osaka, JP;
Yoshihisa Ito, Osaka, JP;
Kuniaki Ishibashi, Osaka, JP;
NITTO DENKO CORPORATION, Ibaraki-Shi, Osaka, JP;
Abstract
The film formation method comprises the steps of: unrolling and feeding an elongated substrate wound in a roll form from a first roll chamber in a first direction from the first roll chamber toward a second roll chamber; degassing the fed substrate; forming a first material film on a first surface in a first film formation chamber; guiding the substrate having the first material film formed thereon to a second film formation chamber in a second direction from the second roll chamber toward the first roll chamber; forming, in the second film formation chamber, a second material film on a second surface opposite the first surface of the substrate when it is being guided in the second direction; taking up, in a third roll chamber provided between the first roll chamber and the second roll chamber, the substrate in a roll state.