The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 26, 2016

Filed:

Mar. 18, 2014
Applicant:

Bruker Daltonik Gmbh, Bremen, DE;

Inventors:

Andreas Brekenfeld, Bremen, DE;

Ralf Hartmer, Hamburg, DE;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05B 5/00 (2006.01); B05B 5/025 (2006.01); H01J 49/26 (2006.01); H01J 49/00 (2006.01); H01J 49/16 (2006.01);
U.S. Cl.
CPC ...
B05B 5/0255 (2013.01); H01J 49/0018 (2013.01); H01J 49/165 (2013.01); H01J 49/26 (2013.01);
Abstract

The invention involves electrospray ionization of dissolved substances at atmospheric pressure in the ion source of a mass spectrometer. A chip with a multitude of spray nozzles is proposed, where each individual spray nozzle is surrounded by several sheath gas nozzles, preferably in a symmetric arrangement, for the jet-like introduction of a sheath gas. A shared attracting-voltage electrode is positioned substantially opposite the spray nozzles. The attracting-voltage electrode may have a tapering (e.g. funnel-shaped) opening above each spray nozzle so that the sheath gas jets are forced to closely envelop the spray jet, which is comprised of ions and very fine droplets. Heavier ions and droplets are thus prevented from discharging on the surfaces of the openings of the attracting-voltage electrode. Special measures can be taken to make all spray nozzles spray uniformly and to supply them with substance peaks from chromatographic or electrophoretic separators as simultaneously as possible.


Find Patent Forward Citations

Loading…