The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 19, 2016

Filed:

Nov. 07, 2012
Applicant:

Omnivision Technologies, Inc., Santa Clara, CA (US);

Inventors:

Chih-Pin Jen, HsinChu, TW;

Ming-Chang Yang, HsinChu, TW;

Sheng-Kuai Yang, HsinChu, TW;

Assignee:

Omnivision Technologies, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B60Q 1/26 (2006.01); F21V 14/00 (2006.01); H05B 37/02 (2006.01);
U.S. Cl.
CPC ...
F21V 14/00 (2013.01); H05B 37/02 (2013.01);
Abstract

An apparatus and method for increasing uniformity in light from a light source at a plurality of targets of the light include a plurality of movable aperture elements, locatable between the light source and the targets, each aperture element defining an aperture through which the light passes from the light source to an associated one of the plurality of targets associated with the aperture element along a longitudinal axis of the aperture element. A holder movably holds the plurality of aperture elements, each of the plurality of aperture elements being movable within the holder along the longitudinal axis of the aperture element to change a feature of light incident on the target associated with the aperture element.


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