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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9238384 B1

PDFFull Text
Date of Patent:
Jan. 19, 2016

Filed:

Jan. 29, 2013

Method of manufacturing microneedle

Applicant:

Toppan Printing Co., Ltd., Tokyo, JP;

Inventors:

Kazuhiko Shiomitsu, Tokyo, JP;

Hiroshi Sugimura, Tokyo, JP;

Toshiaki Kurosu, Tokyo, JP;

Gaku Suzuki, Tokyo, JP;

Takao Tomono, Tokyo, JP;

Assignee:

TOPPAN PRINTING CO., LTD., Tokyo, JP;

Attorney:
Primary Examiner:

Duy Deo

Assistant Examiner:

Erin Bergner

Int. Cl.
CPC ...
B44C 1/20 (2006.01); B44C 1/22 (2006.01); A61M 37/00 (2006.01); B29C 33/42 (2006.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
B44C 1/227 (2013.01); A61M 37/0015 (2013.01); B29C 33/42 (2013.01); B81C 1/00111 (2013.01); A61M 2037/003 (2013.01); A61M 2037/0038 (2013.01); A61M 2037/0046 (2013.01); A61M 2037/0053 (2013.01); B81B 2201/055 (2013.01); B81C 2201/0198 (2013.01);
Abstract

The invention discloses a method of manufacturing a microneedle including the steps of forming an island etching mask having thickness distribution on a substrate, and processing the substrate into a needle by taking advantage of a difference in etching rates between the etching mask and the substrate. The invention enables to readily control a point angle and height of the manufactured needle.

Find Patent Forward Citations

Shiomitsu, Kazuhiko. (2016). Method of manufacturing microneedle (U.S. Patent No. 9238384). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9238384

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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