The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 19, 2016

Filed:

Feb. 08, 2013
Applicant:

Mitsubishi Heavy Industries, Ltd., Tokyo, JP;

Inventors:

Yoshio Seiki, Tokyo, JP;

Shuji Fujii, Tokyo, JP;

Koji Higashino, Tokyo, JP;

Kaori Yoshida, Tokyo, JP;

Masaki Yushima, Hiroshima, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 8/04 (2006.01); B01J 8/00 (2006.01); B01J 8/02 (2006.01); C10K 1/00 (2006.01); C10K 3/04 (2006.01); C01B 3/16 (2006.01); B01J 19/00 (2006.01); B01J 19/24 (2006.01); C10K 3/02 (2006.01); C10K 3/00 (2006.01); C01B 3/02 (2006.01); C01B 3/06 (2006.01); C01B 3/12 (2006.01); C10J 3/46 (2006.01);
U.S. Cl.
CPC ...
B01J 8/005 (2013.01); B01J 8/0278 (2013.01); B01J 8/0457 (2013.01); B01J 8/0492 (2013.01); C01B 3/16 (2013.01); C10K 1/003 (2013.01); C10K 3/04 (2013.01); B01J 2208/00061 (2013.01); B01J 2208/00548 (2013.01); B01J 2219/002 (2013.01); B01J 2219/00213 (2013.01); B01J 2219/00231 (2013.01); C01B 2203/0283 (2013.01); C01B 2203/0415 (2013.01); C01B 2203/0465 (2013.01); C01B 2203/0485 (2013.01); C01B 2203/146 (2013.01); C10J 3/466 (2013.01); C10J 2300/093 (2013.01); C10J 2300/0959 (2013.01); C10J 2300/1653 (2013.01); C10J 2300/1678 (2013.01); Y02E 20/16 (2013.01); Y02E 20/18 (2013.01);
Abstract

A CO shift reaction apparatusaccording to the present invention includes: adiabatic reactorsA toC, each having CO shift catalyst layersA toC filled with a CO shift catalystwhich reforms CO in gasification gas; gas supply lines lto lwhich supply the gasification gasto the adiabatic reactorsA toC; first gas flow rate control unitsA andB which adjust the amounts of gas supplied to the adiabatic reactorsA toC; gas discharge lines lto lwhich discharge processing gas; and second gas flow rate control unitA andB which adjust flow rates of processing gasA-A-B-, andB-


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