The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 12, 2016

Filed:

Jun. 10, 2014
Applicant:

Alpha & Omega Semiconductor Limited, Hamilton, BM;

Inventors:

Anup Bhalla, Santa Clara, CA (US);

Xiaobin Wang, San Jose, CA (US);

Ji Pan, San Jose, CA (US);

Sung-Po Wei, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8234 (2006.01); H01L 29/66 (2006.01); H01L 29/10 (2006.01); H01L 29/78 (2006.01); H01L 29/872 (2006.01); H01L 21/265 (2006.01); H01L 29/06 (2006.01); H01L 29/165 (2006.01); H01L 29/417 (2006.01); H01L 29/423 (2006.01); H01L 29/45 (2006.01); H01L 29/47 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66734 (2013.01); H01L 21/26513 (2013.01); H01L 29/1095 (2013.01); H01L 29/41741 (2013.01); H01L 29/66143 (2013.01); H01L 29/66727 (2013.01); H01L 29/7806 (2013.01); H01L 29/7809 (2013.01); H01L 29/7811 (2013.01); H01L 29/7813 (2013.01); H01L 29/8725 (2013.01); H01L 21/26586 (2013.01); H01L 29/0623 (2013.01); H01L 29/165 (2013.01); H01L 29/41766 (2013.01); H01L 29/4236 (2013.01); H01L 29/456 (2013.01); H01L 29/47 (2013.01);
Abstract

Fabricating a semiconductor device includes: forming a gate trench in an epitaxial layer overlaying a semiconductor substrate; depositing gate material in the gate trench; forming a body; forming a source; forming an active region contact trench that extends through the source and the body into a drain; forming a Schottky barrier controlling layer in the epitaxial layer in bottom region of the active region contact trench; and disposing a contact electrode within the active region contact trench. The Schottky barrier controlling layer controls Schottky barrier height of a Schottky diode formed by the contact electrode and the drain.


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