The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 12, 2016

Filed:

Dec. 06, 2012
Applicant:

Samsung Electro-mechanics Co., Ltd., Gyeonggi-do, KR;

Inventors:

Young Seuck Yoo, Seoul, KR;

Young Ghyu Ahn, Gyeonggi-do, KR;

Yong Suk Kim, Gyeonggi-do, KR;

Sang Moon Lee, Seoul, KR;

Jeong Bok Kwak, Gyeonggi-do, KR;

Kang Heon Hur, Gyeonggi-do, KR;

Sung Kwon Wi, Seoul, KR;

Assignee:

SAMSUNG ELECTRO-MECHANICS CO., LTD., Suwon-Si, Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01F 5/00 (2006.01); H01F 27/28 (2006.01); H01F 41/04 (2006.01); H01F 19/04 (2006.01); H01F 17/00 (2006.01);
U.S. Cl.
CPC ...
H01F 5/003 (2013.01); H01F 19/04 (2013.01); H01F 41/041 (2013.01); H01F 41/046 (2013.01); H01F 2017/0066 (2013.01); H01F 2017/0093 (2013.01); Y10T 29/49075 (2015.01);
Abstract

The present invention discloses a coil part including: a lower magnetic body; primary and secondary lower patterns formed on the lower magnetic body in a spiral shape in parallel to each other; a lower insulating layer covering the primary and secondary lower patterns; primary and secondary upper patterns electrically connected to the primary and secondary lower patterns, respectively, and formed on the lower insulating layer in a spiral shape in parallel to each other to correspond to the primary and secondary lower patterns; and an upper magnetic body formed on the primary and secondary upper patterns, wherein the primary and secondary upper patterns have portions which cross the primary and secondary lower patterns on the plane, and a method of manufacturing the same.


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