The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 12, 2016

Filed:

Nov. 30, 2010
Applicants:

Sylvain Paris, Boston, MA (US);

Eric R. Kee, Hanover, NH (US);

Simon Chen, San Jose, CA (US);

Jue Wang, Kenmore, WA (US);

Inventors:

Sylvain Paris, Boston, MA (US);

Eric R. Kee, Hanover, NH (US);

Simon Chen, San Jose, CA (US);

Jue Wang, Kenmore, WA (US);

Assignee:

Adobe Systems Incorporated, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06G 7/48 (2006.01); G02C 7/02 (2006.01);
U.S. Cl.
CPC ...
G02C 7/028 (2013.01);
Abstract

Techniques are disclosed relating to lens modeling. In one embodiment, a lens model may be generated based on reference images of a pre-determined, known geometric pattern. The lens model may represent a spatially variant blur pattern across the image field of the lens used to capture the reference images. In one embodiment, the lens model may include Gaussian approximations of the blur that may minimize the difference between a location within a reference image and a corresponding location of a pre-determined, known geometric pattern. In one embodiment, the generated lens model may be applied to deblur a new image.


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