The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2016
Filed:
Sep. 26, 2014
Intermec Ip Corporation, Fort Mill, SC (US);
Intermec IP Corporation, Fort Mill, SC (US);
Abstract
Volume dimensioning employs techniques to reduce multipath reflection or return of illumination, and hence distortion. Volume dimensioning for any given target object includes a sequence of one or more illuminations and respective detections of returned illumination. A sequence typically includes illumination with at least one initial spatial illumination pattern and with one or more refined spatial illumination patterns. Refined spatial illumination patterns are generated based on previous illumination in order to reduce distortion. The number of refined spatial illumination patterns in a sequence may be fixed, or may vary based on results of prior illumination(s) in the sequence. Refined spatial illumination patterns may avoid illuminating background areas that contribute to distortion. Sometimes, illumination with the initial spatial illumination pattern may produce sufficiently acceptable results, and refined spatial illumination patterns in the sequence omitted.