The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2016
Filed:
Apr. 01, 2014
Dmetrix, Inc., Tucson, AZ (US);
Chen Liang, Tucson, AZ (US);
Pixuan Zhou, Tucson, AZ (US);
DMETRIX, INC., Tuscon, AZ (US);
Abstract
Method and system of interferometrically measuring, in reflection, a non-spherical surface with two diffracted beams (of different diffraction orders) formed by a diffractive element positioned transversely to the axis of a common-path interferometer. The first diffracted beam substantially maintains the wavefront of a beam incident onto the diffractive element, while the second diffracted beam has a wavefront profile corresponding to the profile of the measured surface. The first diffracted beam may be reflected by the surface in a cat's eye configuration, while the second diffracted beam is reflected by the surface in a confocal configuration. The surface being measured can be modified to substantially balance radiant powers of the first and second diffracted beams upon reflection off the surface.