The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2016
Filed:
Nov. 10, 2010
Stephan Wieber, Karlsruhe, DE;
Matthias Patz, Bottrop, DE;
Reinhard Carius, Jülich, DE;
Torsten Bronger, Aachen, DE;
Michael Cölle, Haltern am See, DE;
Stephan Wieber, Karlsruhe, DE;
Matthias Patz, Bottrop, DE;
Reinhard Carius, Jülich, DE;
Torsten Bronger, Aachen, DE;
Michael Cölle, Haltern am See, DE;
Evonik Degussa GmbH, Essen, DE;
Abstract
The invention relates to a liquid-phase method for the thermal production of silicon layers on a substrate, wherein at least one higher silicon that can be produced from at least one hydridosilane of the generic formula SiH(with a=3-10) being applied to a substrate and then being thermally converted to a layer that substantially consists of silicon, the thermal conversion of the higher silane proceeding at a temperature of 500-900° C. and a conversion time of ≦5 minutes. The invention also relates to silicon layers producible according to said method and to their use.